Integrated Nanofabrication and Cleanroom Facility (INCF)
Lehigh's Integrated Nanofabrication and Cleanroom Facility (INCF) consists of the III-V and Silicon-based nanofabrication cleanrooms, consolidated into a single facility with expansion in both space and equipment. The cleanroom facility supports research and developments in microfabrication techniques, and device fabrications.
Patterning
The INCF houses a Class 100 photolithography room for all of their coating and patterning. Utilizing the programmable Solitec spinner, researchers coat various polymers and resists with up to 5 separate spin speeds and times. The Karl Suss MA 6/BA6 aligner is capable of both front and backside alignment and can achieve 5 um resolution on samples ranging from small pieces up to 3 inches.
Etching
The INCF cleanroom offers flexible plasma and wet etch technology on a wide range of applications. Processing of III-V, and dielectric films is achieved with RIE’s and wet etch processing. Samples ranging from small pieces up to 6 inches can be processed.
Deposition
The INCF maintains a range of chemical and physical vapor deposition (CVD, PVD) tools to prepare high quality thin film coatings for a large range of materials. Our Class 1000 cleanroom facility offers e-beam deposition and plasma-enhanced CVD for metallization and semiconductor deposits. Metalorganic CVD (MOCVD), sputter deposition, and thermal evaporation systems are available.
Processing
INCF processing facilities support a variety of technologies and equipment to meet the needs of our researchers. Precise sample preparation of a wide range of materials is possible utilizing our capabilities.
