Patterning

Karl Suss MA-6, BA-6 Aligner

The MA-6, BA-6 mask aligner and UV exposure tool is designed for high resolution photolithography with critical feature dimensions as small as 2 microns. The instrument can perform both front and backside alignment on pieces and wafers up to 4 inches. Exposure wavelengths of 365 nm (i-line) and 405 nm (h-line) are available with a minimum feature resolution on the order of microns. Soft, hard, and vacuum contact modes are available as well as flood exposure.

Karl Suss MJB-3 Aligner

The Karl Suss MJB-3 aligner is a manually operated contact aligner which use unfiltered UV light, providing exposure at 365 nm (i-line) or 405 nm (h-line). Sample sizes from small pieces up to 3-inch wafers.

Reynolds Tech Developer Wet Bench

The Reynolds Tech Developer Wet Bench is used for photolithography. Digital hotplates are included for resist post exposure bakes or post develop hard bakes.

Solitec Programmable Spinner

The Solitec programmable spinner can be used with photo resists and various polymers. The Solitec spinner is capable of allowing the operator to adjust the ramp speed and up to 5 separate spin speeds and times on a single sample. Sample sizes from ¼” to 6” can be processed.