III-V and Silicon-based nanofabrication cleanrooms are integrated into a single facility, supporting research and development in microfabrication techniques and device fabrication. The cleanroom facility includes photo-lithography (Karl Suss MA-6), intermixing/contact annealing (RTA), III-V and dielectric etchers (RIE), SiO2 and Si3N4 deposition (PECVD), metallization and AR/HR (e-beam evaporator and sputtering), holography system (grating formation for DFB/DBR lasers), wet etching, wafer thinning, laser scribing, and basic laser packaging. The cleanroom also features an electron-beam lithography system, as well as a versatile Focused Ion Beam (FIB) instrument for nanofabrication of photonic crystals and optoelectronic devices.
Lehigh maintains one of the comprehensive electron microscopy facilities in the U.S., with a suite of 10 scanning, transmission and scanning/transmission instruments. These are well suited for characterizing nanoscale structures and chemistry via an unparalleled range of imaging and analytical methods. Moreover, the facilty houses the world’s highest resolution analytical microscope—an instrument custom designed for nanoscale analysis and imaging. Support services including specimen preparation facilities, plasma cleaners, chemical jet polishers, dimplers, wire saws, diamond cutting wheels and a comprehensive metallographic suite. In addition, there are dark rooms, facilities for digital image acquisition and manipulation, offline computers for data analysis, and extensive microscopy-related software. In certain situations, Lehigh personnel can work with users to make modifications to instruments for specific application.