Matt Wehrman graduated from Lehigh University in 2017 with his PhD in Chemical and Biomolecular Engineering, with a focus on Rheology of soft matter. From there, he took a position as a Lithography Engineer with Intel in Hillsboro, OR. At Intel, Matt’s work included enablement of EUV lithography in 10nm technology with a focus on overlay controls. He then moved to Global Foundries where he spent time working on Lithography Processing in a high volume manufacturing environment. Following Global Foundries, Matt moved to a position with IBM Semiconductor where he works in next generation semiconductor research at the Center for Nanoscale Science and Engineering. His work remains in lithography and is currently working toward enabling the ASML High-NA scanner on the site.